JSR Corporation (Japan) and Shin-Etsu are Leading Players in the Photoresist & Photoresist Ancillaries Market

May 27 01:57 2020
JSR Corporation (Japan) and Shin-Etsu are Leading Players in the Photoresist & Photoresist Ancillaries Market

Browse 165 market data Tables and 38 Figures spread through 163 Pages and in-depth TOC on “Photoresist & Photoresist Ancillaries Market
Photoresist & Photoresist Ancillaries Market by Application(Semiconductor & IC, LCD, PCB), Photoresist Type (ArF Immersion, ArF Dry Film, KrF, G-Line & I-line), Ancillaries Type(Anti-reflective coating, Remover, Developer),and Region

The photoresist and photoresist ancillaries market size is estimated to be USD 3.3 billion in 2019 and projected to reach USD 4.5 billion by 2024, at a CAGR of 6.1%. A photoresist is a light-sensitive material which applied to a substrate during photolithography or photoengraving, to enable the desired pattern to be imaged. A properly exposed and developed photoresist masks portions of the substrate with extremely high precision. The growing semiconductor industry in Asia-pacific is expected to drive the Photoresist and Photoresist ancillaries market. It is the fastest-growing region at a CAGR of 6.5%, which is attributed to the growing demand for wearable devices, smartphones, and other electronic devices. North America accounted for the second-largest share of 15% of the global photoresist and photoresist ancillaries market in 2018. These top 2 regions are expected to be followed by Europe, South America, and the Middle East & Africa, in terms of value, during the forecast period.

The innovations in semiconductors & ICs are always focused on providing faster, smaller, and less energy-consuming circuit developments. The photoresist market is also driven by the rising demand for high-resolution LCD screens, flexible Printed circuit boards, and high added-value consumer electronics devices. Growth in the semiconductor industry and dynamic flat panel display technology trends are expected to be the major driving factors for the growth of the photoresist and photoresist ancillaries market. The upcoming nanoelectromechanical systems (NEMS) are anticipated to provide opportunities for players in the photoresist and photoresist ancillaries industry.

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The leading players in the global Photoresist and Photoresist ancillaries market includes Tokyo Ohka Kogyo Co., Ltd (Japan), JSR Corporation (Japan), DuPont (US), Shin-Etsu Chemical Co., Ltd (Japan), Fujifilm Corporation (Japan), Sumitomo Chemical Co., Ltd. (Japan), ALLRESIST (Germany), Merck Group (Germany), Micro Resist Technology (Germany), and DJ MicroLaminates (US).

JSR Corporation (Japan) is one of the largest rubber and chemical solutions offering companies in the world. The company operates through four business segments, namely, elastomers business, plastic business, digital solution business, and lifesciences business. It offers photoresist materials under the digital solution business. The company has its presence in 41 overseas location including the US, Europe, China, South Korea, Taiwan, and Thailand. In March 2018, JSR Corporation set up a new manufacturing facility in Belgium. Through this expansion, the company aims to enable the manufacturing and quality control of EUV photoresists for the semiconductors industry.

Shin-Etsu Chemical is one of the leading manufacturers and distributors of synthetic resin and other chemicals. The company operates through six business segments, namely, PVC/chlor-alkali business, semiconductor silicon business, silicone business, electronics and functional materials business, specialty chemicals, and processing, trading & specialized services business. It offers photoresist under the electronics and functional materials business. The company has a strong presence in over 20 countries and regions. In November 2018, Shin-Etsu Chemical established its first overseas photoresist production plant in Yunlin County, Taiwan. The new plant is expected to create a stable supply chain to device manufacturers located in the vicinity. The company also planned to invest USD 126 million for the expansion of its photomask business in October 2018. The new investment will be implemented at the existing plants of Echizen City and Naoetsu City. It is expected that this move will increase its photomask production capacity by 30%.

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